Max. € 60,000
Detachering via YER, In dienst van opdrachtgever
Consultancy & HR
Over deze vacature
Is solving complex engineering problems in a multi-disciplinary team your passion? Does working in a multi-cultural and international environment makes you spin? Does contributing to the world’s most advanced lithography machines makes you feel responsible and proud? If all this sounds like music to your ears, then this might be the right opportunity for you.
The Development & Engineering DUV sector is responsible for the specification, design and development of ASML DUV products. The DUV Optical Column Development department is responsible for the image quality measurement and control used in DUV Scanners. As a part of ASML’s Image Metrology team, your job mission is to design , develop, realize and qualify solutions that are gating for the nanometer performance of our lithographic machines and enable the extension of the roadmap of the lithographic industry (Moore’s law).
Metrology software solutions incorporate system design aspects that cover the spectrum from design, development, realization, integration, manufacturing, installation, to support. As an image metrologist, you will typically work in design feasibility studies, global and detailed design, integration, validation and verification of algorithms and software solutions.
ASML is a successful Dutch high-tech enterprise that produces complex lithography systems used by chip manufacturers in the production of integrated circuits. ASML is at the cutting edge of this technology and delivers systems to all the world's leading chip manufacturers. ASML's employees are among the most creative talents in the fields of physics, mathematics, chemistry, mechanical engineering and software. Every day they collaborate in close-knit multidisciplinary teams in which members listen to and learn from one another and exchange ideas. It is the ideal environment for professional development and personal growth.
ASML is headquartered in Veldhoven, the Netherlands.
You will be employed by YER and seconded to ASML. We offer:
- Good employee benefits (e.g. work-life balance, pension, lease car, bonus model)
- Challenging assignments
- Excellent guidance from your consultant and YER's back office
- Development opportunities, including the YER Talent Development Programme with a personal coach
- Intensive support for international candidates (including Dutch lessons, tax-return and accommodation assistance)
- Cooperative and results and relationship-driven
- Friendly atmosphere and open culture
- Community/network with other technology professionals from a variety of multinationals
- Events and master classes with interesting speakers and attractive companies
MSc, PDEng or PhD (physics, mathematics, technical computing science, mechanical/electrical engineering).
Experience with Design, Matlab, Mathematica, Maple, UML methodology is required .Knowledge of Python and statistical methods, numerical analysis, system budgeting. Knowledge about the SW development process necessary. Experience with filtering and system identification, finite difference and element methods, machine learning, process monitoring is a pre. Moreover, experience in planned and project based way of working with AGILE SCRUM is a pre.
We expect you to be a good communicator, team player, self-starter, to take initiative and to be result oriented.
Context of the position
This position is within the DUV D&E Department –Image Metrology, which is responsible for the optimal imaging of the ASML’s wafer scanners and for the measurements, models and calibrations which are required for optimal imaging.
The holder of this position reports to the Group Leader Metrology Image Align and operates within a multidisciplinary development project team.